Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Concept and feasibility of aerial imaging measurements on EUV masks

[+] Author Affiliations
Sascha Perlitz, Wolfgang Harnisch, Ulrich Strößner

Carl Zeiss SMS GmbH (Germany)

Heiko Feldmann, Dirk Hellweg, Michael Ringel

Carl Zeiss SMT AG (Germany)

Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850U (April 01, 2011); doi:10.1117/12.895208
Text Size: A A A
From Conference Volume 7985

  • 27th European Mask and Lithography Conference
  • Uwe F.W. Behringer
  • Dresden, Germany | January 18, 2011

abstract

On the road to and beyond the 22nm half-pitch on chip patterning technology, 13.5nm EUVL is widely considered the best next technology generation following deep ultraviolet lithography. The availability of an actinic measurement system for the printability analysis of mask defects to ensure defect-free mask manufacturing and cost-effective high-volume EUV production is an infrastructural prerequisite for the EUVL roadmap and represents a significant step toward readiness for commercialization of EUV for high-volume-manufacturing . Carl Zeiss and SEMATECH's EUVL Mask Infrastructure (EMI) program started a concept study and feasibility plan for a tool that emulates the aerial image formed by a EUV lithography scanner supporting the 22 nm half-pitch node requirements with extendibility to the 16nm half-pitch node. The study is targeting a feasible concept for the AIMSTM EUV platform, bridging a significant gap for EUV mask metrology.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Sascha Perlitz ; Wolfgang Harnisch ; Ulrich Strößner ; Heiko Feldmann ; Dirk Hellweg, et al.
"Concept and feasibility of aerial imaging measurements on EUV masks", Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850U (April 01, 2011); doi:10.1117/12.895208; http://dx.doi.org/10.1117/12.895208


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.