Paper
19 January 2011 Dual-wavelength DFB fiber laser based on equivalent phase shift and double exposure method
Author Affiliations +
Proceedings Volume 7986, Passive Components and Fiber-Based Devices VII; 79860C (2011) https://doi.org/10.1117/12.888033
Event: Asia Communications and Photonics Conference and Exhibition, 2010, Shanghai, Shanghai, China
Abstract
A special sampling structure based on the double exposure technology is proposed to achieve dual-wavelength lasing in the distributed feedback (DFB) fiber laser. This structure is composed of two grating pitches in one sampling period, which could be realized by changing the fiber's length in the fabrication. And through employing an equivalent phase shift, only a submicrometer-level precision is required for precise phase control. Then a stable dual-wavelength laser with the spacing of 400pm is obtained in the experiment successfully. The output power is 30.46uW and the SMSR is 46dB under a pumped power of 146mw.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Linghui Jia, Liang Zhang, Zuowei Yin, and Xiangfei Chen "Dual-wavelength DFB fiber laser based on equivalent phase shift and double exposure method", Proc. SPIE 7986, Passive Components and Fiber-Based Devices VII, 79860C (19 January 2011); https://doi.org/10.1117/12.888033
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KEYWORDS
Phase shifts

Fiber lasers

Fiber Bragg gratings

Ultraviolet radiation

Control systems

Ferroelectric materials

Fiber optic communications

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