Recent performance results of Nikon immersion lithography tools

Andrew J. Hazelton; Kenichi Shiraishi; Shinji Wakamoto; Yuuki Ishii; Masahiko Okumura; Nobutaka Magome; Hiroyuki Suzuki

doi:10.1117/12.771823

7 March 2008 Recent performance results of Nikon immersion lithography tools

Andrew J. Hazelton, Kenichi Shiraishi, Shinji Wakamoto, Yuuki Ishii, Masahiko Okumura, Nobutaka Magome, Hiroyuki Suzuki

Proceedings Volume 6924, Optical Microlithography XXI; 69241N (2008) https://doi.org/10.1117/12.771823
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Nikon's production immersion scanners, including the NSR-S609B and the NSR-S610C, have now been in the field for over 2 years. With these tools, 55 nm NAND Flash processes became the first immersion production chips in the world, and 45 nm NAND Flash process development and early production has begun. Several logic processes have also been developed on these tools. This paper discusses the technical features of Nikon's immersion tools, and their results in production.

Citation Download Citation

Andrew J. Hazelton, Kenichi Shiraishi, Shinji Wakamoto, Yuuki Ishii, Masahiko Okumura, Nobutaka Magome, and Hiroyuki Suzuki "Recent performance results of Nikon immersion lithography tools", Proc. SPIE 6924, Optical Microlithography XXI, 69241N (7 March 2008); https://doi.org/10.1117/12.771823

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