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Proceedings Article

Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence

[+] Author Affiliations
Saulius Nevas, Farshid Manoocheri, Erkki Ikonen

Helsinki Univ. of Technology (Finland)

Alexander V. Tikhonravov, Michail A. Kokarev, Michail K. Trubetskov

Moscow State Univ. (Russia)

Proc. SPIE 5250, Advances in Optical Thin Films, 234 (February 25, 2004); doi:10.1117/12.512700
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From Conference Volume 5250

  • Advances in Optical Thin Films
  • Claude Amra; Norbert Kaiser; H. Angus Macleod
  • St. Etienne, France | September 30, 2003

abstract

Oblique-incidence spectrophotometric measurements are considered for reliable determination of the refractive index and thickness of thin-film coatings. By using a model of the spectral transmittance of thin film samples, the effect of systematic factors on the determined thin-film parameters is analyzed. The optical parameters of a silicon-dioxide sample determined from the experimental results obtained with the HUT spectrophotometer are consistent for the incidence angles between 0 and 56.4 degrees, demonstrating high accuracy of film-parameter determination.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Saulius Nevas ; Farshid Manoocheri ; Erkki Ikonen ; Alexander V. Tikhonravov ; Michail A. Kokarev, et al.
"Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence", Proc. SPIE 5250, Advances in Optical Thin Films, 234 (February 25, 2004); doi:10.1117/12.512700; http://dx.doi.org/10.1117/12.512700


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