Paper
7 March 2008 Extended Nijboer-Zernike (ENZ) based mask imaging: efficient coupling of electromagnetic field solvers and the ENZ imaging algorithm
Olaf T. A. Janssen, Sven van Haver, Augustus J. E. M. Janssen, Joseph J. M. Braat, H. Paul Urbach, Silvania F. Pereira
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Abstract
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction. We show that the efficiency of a mask imaging algorithm, derived from this theory, can be increased. By adjusting the basic Finite Difference Time Domain (FDTD) algorithm, we can calculate the near field of isolated mask structures efficiently, without resorting to periodic domains. In addition, the calculations for the points on the entrance sphere of the imaging system can be done separately with a Fourier transformed Stratton-Chu nearto- far-field transformation. By clever sampling in the radial direction of the entrance pupil, the computational effort is already reduced by at least a factor of 4.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olaf T. A. Janssen, Sven van Haver, Augustus J. E. M. Janssen, Joseph J. M. Braat, H. Paul Urbach, and Silvania F. Pereira "Extended Nijboer-Zernike (ENZ) based mask imaging: efficient coupling of electromagnetic field solvers and the ENZ imaging algorithm", Proc. SPIE 6924, Optical Microlithography XXI, 692410 (7 March 2008); https://doi.org/10.1117/12.772497
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Cited by 11 scholarly publications.
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KEYWORDS
Finite-difference time-domain method

Photomasks

Electromagnetism

Interfaces

Lithography

Near field

Algorithm development

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