Exposure tool specific post-OPC verification

John Sturtevant; Srividya Jayaram; Le Hong

doi:10.1117/12.773340

4 March 2008 Exposure tool specific post-OPC verification

John Sturtevant, Srividya Jayaram, Le Hong

Proceedings Volume 6925, Design for Manufacturability through Design-Process Integration II; 69250T (2008) https://doi.org/10.1117/12.773340
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The evolution of high-NA projection optics design and manufacturing tolerances has been remarkable in recent years. Nevertheless, different instances of identical scanner models can still exhibit unique optical fingerprints which can impart subtle patterning differences for a given mask exposed at nominally identical conditions on different scanners. In some cases, a product can be shown statistically to yield lower when a certain layer is exposed on a particular scanner. Thus it is common to have a certain subset of the total population of tools allowed for certain critical levels, such as gate. Since a single mask is typically shared between the multiple allowed scanners, the optical proximity correction model which is employed in the generation of that mask must represent the average fingerprint of those tools. In practice, CD data may be collected from multiple tools, but more often a single tool is somehow identified as the "golden" tool for the purpose of calibrating the OPC model. Once the mask is generated, however, its printing behavior on multiple scanners can readily be simulated using tool-specific optical models. Such models can be easily generated based upon known optical fingerprint data, such as measured illumination source maps, Jones pupil or Zernike aberration files. This paper investigates the use of tool-specific optical models to elucidate the intersection of design and process variability, which will manifest differently on each scanner, depending upon subtle details of the scanner fingerprint.

Citation Download Citation

John Sturtevant, Srividya Jayaram, and Le Hong "Exposure tool specific post-OPC verification", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69250T (4 March 2008); https://doi.org/10.1117/12.773340

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available