Paper
19 March 2008 Layout patterning check for DFM
Author Affiliations +
Abstract
Design rules and the design rule check (DRC) utility are conventional approaches to design for manufacturability (DFM). The DRC utility is based on unsophisticated rules to check the design layout in a simple environment. As the design dimension shrinks drastically, the introduction of a more powerful DFM utility with model-based layout patterning check (LPC) becomes mandatory for designers to filter process weak-points before taping out layouts. In this paper, a system of integrated hotspot scores consisting of three lithography sensitive indexes is proposed to assist designers to circumvent risky layout patterns in lithography. With the hotspot fixing guideline and the hotspot severity classification deduced from the scoring system provided in this paper, designers can deliver much more manufacturable designs.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. C. Chang, I. C. Shih, J. F. Lin, Y. S. Yen, C. M. Lai, W. C. Huang, R. G. Liu, and Y. C. Ku "Layout patterning check for DFM", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251R (19 March 2008); https://doi.org/10.1117/12.775420
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lithography

Design for manufacturing

Nanoimprint lithography

Manufacturing

Optical lithography

Design for manufacturability

Critical dimension metrology

Back to Top