SEM contour-based model OPC calibrated with optically sensitive patterns

Jee-Eun Jung; Mi-Kyeong Lee; Yong-Jin Cho; Sang-Ho Lee; Young-Seog Kang; Young-Kyou Park

doi:10.1117/12.772485

4 March 2008 SEM contour-based model OPC calibrated with optically sensitive patterns

Jee-Eun Jung, Mi-Kyeong Lee, Yong-Jin Cho, Sang-Ho Lee, Young-Seog Kang, Young-Kyou Park

Proceedings Volume 6925, Design for Manufacturability through Design-Process Integration II; 692516 (2008) https://doi.org/10.1117/12.772485
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

As the device's design rule has been scaled down, the needs of robust and accurate OPC (Optical Proximity Correction) model have been increased. In order to meet the needs, we adopt the method of increasing the image parameter space coverage, such as using SEM-contour based OPC model which provides hundreds or thousands of measurement data set from each SEM image. It differs from traditional model calibration measurement data set from 1D or 2D symmetric test pattern which is just one CD measurement data from one pattern. In SEM contour-based model OPC, it is important that what kinds of patterns are chosen for model calibration and how the SEM image contours are extracted to improve model accuracy. In this paper, we selected the SEM images for SEM contour modeling analyzing aerial image intensity variation. As finding optically sensitive patterns, we could make robust and accurate OPC model across the process window. In this SEM-contour based OPC modeling, we applied the method from commercial SEM company.

Citation Download Citation

Jee-Eun Jung, Mi-Kyeong Lee, Yong-Jin Cho, Sang-Ho Lee, Young-Seog Kang, and Young-Kyou Park "SEM contour-based model OPC calibrated with optically sensitive patterns", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 692516 (4 March 2008); https://doi.org/10.1117/12.772485

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