A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a die-to-database verification tool (NGR2100)

Tadashi Kitamura; Toshiaki Hasebe; Kazufumi Kubota; Futoshi Sakai; Shinichi Nakazawa; Michael Hoffman; Masahiro Yamamoto; Masahiro Inoue

doi:10.1117/12.772706

1 April 2008 A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a die-to-database verification tool (NGR2100)

Tadashi Kitamura, Toshiaki Hasebe, Kazufumi Kubota, Futoshi Sakai, Shinichi Nakazawa, Michael Hoffman, Masahiro Yamamoto, Masahiro Inoue

Author Affiliations +

Proceedings Volume 6925, Design for Manufacturability through Design-Process Integration II; 692519 (2008) https://doi.org/10.1117/12.772706
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A new Robust Process Window Qualification (PWQ) Technique to perform systematic defect characterization to enlarge the Lithographic process window is described, using a Die-to-Database Verification Tool (NGR2100).

Citation Download Citation

Tadashi Kitamura, Toshiaki Hasebe, Kazufumi Kubota, Futoshi Sakai, Shinichi Nakazawa, Michael Hoffman, Masahiro Yamamoto, and Masahiro Inoue "A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a die-to-database verification tool (NGR2100)", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 692519 (1 April 2008); https://doi.org/10.1117/12.772706

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