Pickup of ion beam etching depth information during microfabrication

Guangxing Zhao; Yan Wang

doi:10.1117/12.521773

2 September 2003 The pickup of ion beam etching depth information during microfabrication

Guangxing Zhao, Yan Wang

Proceedings Volume 5253, Fifth International Symposium on Instrumentation and Control Technology; (2003) https://doi.org/10.1117/12.521773
Event: Fifth International Symposium on Instrumentation and Control Technology, 2003, Beijing, China

Abstract

Based on scalar quantity diffraction theory, the phase grating of micro-optics structure is studied. The light intensity distribution of diffraction fields is obtained. Results show that the peak position of light intensity moved with the variation of ion beam etching depth. The conclusion can be used in the pick-up of etching depth information during micro-fabrication, and it has important significance in ion beam etching depth's accurate control.

Citation Download Citation

Guangxing Zhao and Yan Wang "The pickup of ion beam etching depth information during microfabrication", Proc. SPIE 5253, Fifth International Symposium on Instrumentation and Control Technology, (2 September 2003); https://doi.org/10.1117/12.521773

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