Nondestructive in-line monitoring method for diffusion process control in InP

Yahong Y.H. Qian; Chris Pawlowicz; Vlad Temchenko; Christina Elliott; Andrew Woodard; Tedeusz Bryskiewicz; Kim Kirkwood; Kevin Hewitt

doi:10.1117/12.543541

15 December 2003 Nondestructive in-line monitoring method for diffusion process control in InP

Yahong Y.H. Qian, Chris Pawlowicz, Vlad Temchenko, Christina Elliott, Andrew Woodard, Tedeusz Bryskiewicz, Kim Kirkwood, Kevin Hewitt

Author Affiliations +

Proceedings Volume 5260, Applications of Photonic Technology 6; (2003) https://doi.org/10.1117/12.543541
Event: Applications of Photonic Technology, 2003, Quebec City, Québec, Canada

Abstract

We report a non-destructive in-line monitoring method developed for Cd diffusion into InP on SACM-APD structure. Photocurrent vs voltage measurement are taken directly via proving diffused diodes on a wafer. We demonstrate that there is linear correlation between punch-through voltages Vpt on the photo I-V curves and diffusion depth measured by SIMS and Polaron profiles. It has been established that Vpt can be extracted easily from I-V curves and used for re-diffusion to approach target depth.

Citation Download Citation

Yahong Y.H. Qian, Chris Pawlowicz, Vlad Temchenko, Christina Elliott, Andrew Woodard, Tedeusz Bryskiewicz, Kim Kirkwood, and Kevin Hewitt "Nondestructive in-line monitoring method for diffusion process control in InP", Proc. SPIE 5260, Applications of Photonic Technology 6, (15 December 2003); https://doi.org/10.1117/12.543541

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