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Proceedings Article

Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

[+] Author Affiliations
Yinbing Bai, A. Ping Zhang

Zhejiang Univ. (China)

Proc. SPIE 7990, Optical Sensors and Biophotonics II, 799006 (December 26, 2010); doi:10.1117/12.888450
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From Conference Volume 7990

  • Optical Sensors and Biophotonics II
  • Qingming Luo; Frank Chuang; Stefan Haacke; Chih-Chung Yang
  • Shanghai, China | December 08, 2010

abstract

We present some novel periodic structures with different internal nanopatterns based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures are fabricated with precisely control of exposure directions and doses as well as the total number of exposures. Experimental fabrication of microstructures are demonstrated and comparied with numerical simulations of intensity distributions. The size of the fabricated samples is around 1 square centimeter. The diffraction spectra of the fabricated samples are measured and tested. The experiment results show such a fabrication technology is very promising for making diverse large-area microstructures with complex internal nanopatterns.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Yinbing Bai and A. Ping Zhang
"Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography", Proc. SPIE 7990, Optical Sensors and Biophotonics II, 799006 (December 26, 2010); doi:10.1117/12.888450; http://dx.doi.org/10.1117/12.888450


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