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Proceedings Article

Some techniques to characterize multilayers and their interfaces

[+] Author Affiliations
P. Jonnard

Lab. de Chimie Physique-Matière et Rayonnement, CNRS, Univ. Pierre et Marie Curie (France)

Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951T (February 17, 2011); doi:10.1117/12.888172
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From Conference Volume 7995

  • Seventh International Conference on Thin Film Physics and Applications
  • Junhao Chu; Zhanshan Wang
  • Shanghai, China | September 24, 2010

abstract

We describe some destructive and non-destructive techniques that can be useful to examine multilayers and particularly their interfaces. The presented non-destructive techniques allow obtaining the electron structure of the sample and then determine the chemical states of the elements in the multilayer from the analysis of the occupied (x-ray emission and photoemission spectroscopies) or unoccupied (x-ray absorption or electron energy loss spectroscopies) states. Among the destructive techniques we introduce secondary ion mass spectrometry and transmission electron microscopy that bring some information about the structural quality of the samples.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

P. Jonnard
"Some techniques to characterize multilayers and their interfaces", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951T (February 17, 2011); doi:10.1117/12.888172; http://dx.doi.org/10.1117/12.888172


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