Paper
11 March 2008 Growth and characterization of AlN thin films on free-standing diamond substrates
Jian Huang, Yiben Xia, Linjun Wang, Jianmin Liu, Jinyong Xu, Guang Hu, Xuefeng Zhu
Author Affiliations +
Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69841S (2008) https://doi.org/10.1117/12.792638
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
The free-standing diamond films with a smooth and high quality nucleation side were prepared by hot filament chemical vapor deposition (HFCVD) method. The nucleation side of the films had a mean surface roughness of 1.6nm.AlN films were then deposited on the nucleation side of the above diamond films by radio-frequency (RF) reactive magnetron sputtering method. The structure characteristics of AlN films deposited under different working pressure (p), sputtering power (w) and sputtering plasma composition were studied. The optimized parameters for the growth of high c-axis orientation AlN films were obtained: p=0.2Pa,w=600w and Ar/N2=3:1.Surface morphologies of AlN films deposited under these parameter, tested by means of atomic force microscope (AFM), showed that the mean surface roughness was about 4.1nm.It also had a strong c-axis orientation structure investigated by X-ray diffraction (XRD). All results above suggested that the AlN/diamond structure prepared in this work was ideal for the application of high frequency surface acoustic wave devices (SAW) device.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jian Huang, Yiben Xia, Linjun Wang, Jianmin Liu, Jinyong Xu, Guang Hu, and Xuefeng Zhu "Growth and characterization of AlN thin films on free-standing diamond substrates", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69841S (11 March 2008); https://doi.org/10.1117/12.792638
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KEYWORDS
Aluminum nitride

Diamond

Sputter deposition

Thin films

Surface roughness

Silicon films

Nitrogen

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