Thick and adherent (cBN/nano-diamond)3 multilayer films deposited by RF magnetron sputtering

H. Q. Li; K. M. Leung; W. J. Zhang

doi:10.1117/12.792275

11 March 2008 Thick and adherent (cBN/nano-diamond)₃ multilayer films deposited by RF magnetron sputtering

H. Q. Li, K. M. Leung, W. J. Zhang

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842S (2008) https://doi.org/10.1117/12.792275
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

Using physical vapor deposition (PVD) method, the (cBN/nano-diamond)₃ multilayer film with phase purity, high hardness and low residual stress was synthesized on silicon substrates supported by a thick nano-diamond buffer. This method presented is characteristic with the direct cBN growth on diamond without soft, non-cubic BN interface layers; the synthesis of multilayer films with extraordinary adhesion to the substrates and higher hardness than a cBN single film, and the stress of the multilayer film can be reduced to only one forth of that of a cBN single film. These prime technological properties open the route to the mechanical exploitation of cBN films.

Citation Download Citation

H. Q. Li, K. M. Leung, and W. J. Zhang "Thick and adherent (cBN/nano-diamond)₃ multilayer films deposited by RF magnetron sputtering", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842S (11 March 2008); https://doi.org/10.1117/12.792275

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