Contact pressure distribution of chemical mechanical polishing based on bionic polishing pad

Jun Wang; Xue-Ling Xing; Yu-Shan Lu; Liao-Yuan Zhang

doi:10.1117/12.883014

26 May 2011 Contact pressure distribution of chemical mechanical polishing based on bionic polishing pad

Jun Wang, Xue-Ling Xing, Yu-Shan Lu, Liao-Yuan Zhang

Proceedings Volume 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering; 79972U (2011) https://doi.org/10.1117/12.883014
Event: Fourth International Seminar on Modern Cutting and Measuring Engineering, 2010, Beijing, China

Abstract

In order to improve the uniformity of the contact pressure distribution of chemical mechanical polishing, based on the Winkler foundation principle of mechanics and phyllotaxis theory of biology, a kind of stannum fixed abrasive pad with bionic surface texture has been designed, and the contact mechanism and ANSYS model have been established. By the calculating and analysis of contact pressure distribution on polishing wafer, the contact pressure distribution and the effects of the geometrical and physical parameters polishing pad on the contact pressure distributions have been obtained. The results show that the horizontal effect of the polishing pad is very small, the uniformity of contact pressure distribution can be improved, and there are the phyllotactic parameters which make the contact pressure distribution more uniformity.

Citation Download Citation

Jun Wang, Xue-Ling Xing, Yu-Shan Lu, and Liao-Yuan Zhang "Contact pressure distribution of chemical mechanical polishing based on bionic polishing pad", Proc. SPIE 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering, 79972U (26 May 2011); https://doi.org/10.1117/12.883014

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