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Proceedings Article

Analysis of the polishing slurry flow of chemical mechanical polishing by polishing pad with phyllotactic pattern

[+] Author Affiliations
Yushan Lv, Tian Zhang, Jun Wang, Nan Li, Min Duan, Xue-Ling Xing

Shenyang Ligong Univ. (China)

Proc. SPIE 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering, 79972V (May 26, 2011); doi:10.1117/12.883091
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From Conference Volume 7997

  • Fourth International Seminar on Modern Cutting and Measurement Engineering
  • Jiezhi Xin; Lianqing Zhu; Zhongyu Wang
  • Beijing, China | December 10, 2010

abstract

In order to make the polishing slurry distribution more uniform over the polishing region, a new kind of polishing pad, which has sunflower seed pattern, has been designed based on the phyllotaxis theory of biology, and the boundary conditions of polishing slurry flow have been established. By the help of computational fluid dynamics software (FLUENT), the flow state of the polishing slurry is simulated and the effects of the phyllotactic parameters of polishing pad on the flow field of polishing slurry are analyzed. The results show that when the polishing slurry is imported from the center of phyllotaxis polishing pad, the slurry flows along the counterclockwise and clockwise spiral grooves of phyllotatic pattern, which make fluid flow divergence around, and the flow field becomes more uniform.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Yushan Lv ; Tian Zhang ; Jun Wang ; Nan Li ; Min Duan, et al.
"Analysis of the polishing slurry flow of chemical mechanical polishing by polishing pad with phyllotactic pattern", Proc. SPIE 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering, 79972V (May 26, 2011); doi:10.1117/12.883091; http://dx.doi.org/10.1117/12.883091


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