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Proceedings Article

High-throughput EUV reflectometer for EUV mask blanks

[+] Author Affiliations
Rainer Lebert, Christian Wies, Larissa Juschkin, Bernhard Jaegle, Manfred Meisen

AIXUV GmbH (Germany)

Lutz Aschke, Frank Sobel, Holger Seitz

Schott Lithotec AG (Germany)

Frank Scholze, Gerhard Ulm

Physikalisch-Technische Bundesanstalt (Germany)

Konstantin Walter, Willi Neff, Klaus Bergmann

Fraunhofer-Institut fuer Lasertechnik (Germany)

Wolfgang Biel

Forschungszentrum Juelich GmbH, EURATOM Association (Germany)

Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 808 (May 20, 2004); doi:10.1117/12.537012
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From Conference Volume 5374

  • Emerging Lithographic Technologies VIII
  • R. Scott Mackay
  • Santa Clara, CA | February 22, 2004

abstract

A prototype of a reflectometer for masks and mask blanks has been set-up in autumn 2003 for in-house quality check of EUV mask blanks at Schott Lithotec. The target specifications are those under discussion as SEMI standard for EUV mask blank reflectometry. Additionally, the identified demands for semiconductor capital investment for future actinic EUV metrology, high throughputs and small measuring spots, were taken into account for the tool development. Effective use of the emission from a laboratory discharge source is achieved by using polychromatic reflectometry, which has been shown to deliver results about a factor of 100 faster with the same source power and needs less mechanical overhead than a monochromatic reflectometer. The hardware concept, first results and discussion of a test of the performance with respect to resolution, uncertainty and reproducibility will be represented. Jointly with the Physikalisch-Technische Bundesanstalt"s laboratory for radiometry at BESSY II the traceability to storage ring metrology, the calibration and the validation of the concepts will be assessed.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Rainer Lebert ; Christian Wies ; Larissa Juschkin ; Bernhard Jaegle ; Manfred Meisen, et al.
"High-throughput EUV reflectometer for EUV mask blanks", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 808 (May 20, 2004); doi:10.1117/12.537012; http://dx.doi.org/10.1117/12.537012


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