Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

High-throughput EUV reflectometer for EUV mask blanks

[+] Author Affiliations
Rainer Lebert, Christian Wies, Larissa Juschkin, Bernhard Jaegle, Manfred Meisen

AIXUV GmbH (Germany)

Lutz Aschke, Frank Sobel, Holger Seitz

Schott Lithotec AG (Germany)

Frank Scholze, Gerhard Ulm

Physikalisch-Technische Bundesanstalt (Germany)

Konstantin Walter, Willi Neff, Klaus Bergmann

Fraunhofer-Institut fuer Lasertechnik (Germany)

Wolfgang Biel

Forschungszentrum Juelich GmbH, EURATOM Association (Germany)

Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 808 (May 20, 2004); doi:10.1117/12.537012
Text Size: A A A
From Conference Volume 5374

  • Emerging Lithographic Technologies VIII
  • R. Scott Mackay
  • Santa Clara, CA | February 22, 2004


A prototype of a reflectometer for masks and mask blanks has been set-up in autumn 2003 for in-house quality check of EUV mask blanks at Schott Lithotec. The target specifications are those under discussion as SEMI standard for EUV mask blank reflectometry. Additionally, the identified demands for semiconductor capital investment for future actinic EUV metrology, high throughputs and small measuring spots, were taken into account for the tool development. Effective use of the emission from a laboratory discharge source is achieved by using polychromatic reflectometry, which has been shown to deliver results about a factor of 100 faster with the same source power and needs less mechanical overhead than a monochromatic reflectometer. The hardware concept, first results and discussion of a test of the performance with respect to resolution, uncertainty and reproducibility will be represented. Jointly with the Physikalisch-Technische Bundesanstalt"s laboratory for radiometry at BESSY II the traceability to storage ring metrology, the calibration and the validation of the concepts will be assessed.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

Rainer Lebert ; Christian Wies ; Larissa Juschkin ; Bernhard Jaegle ; Manfred Meisen, et al.
"High-throughput EUV reflectometer for EUV mask blanks", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 808 (May 20, 2004); doi:10.1117/12.537012; http://dx.doi.org/10.1117/12.537012

Access This Article
Sign In to Access Full Content
Please Wait... Processing your request... Please Wait.
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).



Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections


Buy this article ($18 for members, $25 for non-members).
Sign In