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Proceedings Article

Status of EUV-lamp development and demonstration of applications

[+] Author Affiliations
Rainer Lebert, Christian Wies, Bernhard Jaegle, Larissa Juschkin, Ulrich Bieberle, Manfred Meisen

AIXUV GmbH (Germany)

Willi Neff, Klaus Bergmann, Konstantin Walter, Oliver Rosier

Fraunhofer-Institut fuer Lasertechnik (Germany)

Max C. Schuermann, Thomas Missalla

JENOPTIK Mikrotechnik GmbH (Germany)

Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 943 (May 20, 2004); doi:10.1117/12.538058
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From Conference Volume 5374

  • Emerging Lithographic Technologies VIII
  • R. Scott Mackay
  • Santa Clara, CA | February 22, 2004

abstract

Compact, flexible laboratory sources offer advanced flexibility in developing components for EUV-lithography by supplementing beamlines at storage rings. Hence, they are the basis for transferring EUV-metrology and technology to individual, industrial and university R&D labs. Laboratory sources have features similar to the sources planned for EUVL production on one hand and offer high flexibility like storage ring beamlines on the other hand. Discharge based EUV sources offer some flexibility, which allow for tuning of the spectral and spatial characteristics of their emission. Depending on the system complexity sources can be supplied in various forms ranging from low budget semi-manual systems over OEM components to fully automatic stand-alone sources. As power scaling has been demonstrated by just adding higher power generators and cooling, these sources can be matched to various levels of flux requirements. AIXUV"s discharge based EUV-sources have been used as beamline supplement for tasks closely connected with the development of EUV-Lithography. Examples are: development of tools for EUV source characterization (prototype testing, qualification and calibration), "in-band-EUV" open frame resist exposure, reflectometry of EUV mask blanks and EUV mirrors and for basic research using XUV radiation as thin film analytics and EUV microscopy.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Rainer Lebert ; Christian Wies ; Bernhard Jaegle ; Larissa Juschkin ; Ulrich Bieberle, et al.
"Status of EUV-lamp development and demonstration of applications", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, 943 (May 20, 2004); doi:10.1117/12.538058; http://dx.doi.org/10.1117/12.538058


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