Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

High-resolution optical overlay metrology

[+] Author Affiliations
Richard M. Silver, Ravikiran Attota, Michael Stocker, Jau-Shi J. Jun, Egon Marx, Robert D. Larrabee

National Institute of Standards and Technology (USA)

Michael Bishop

International SEMATECH (USA)

Mark P. Davidson

Spectel Company (USA)

Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, 78 (May 24, 2004); doi:10.1117/12.539028
Text Size: A A A
From Conference Volume 5375

  • Metrology, Inspection, and Process Control for Microlithography XVIII
  • Richard M. Silver
  • Santa Clara, CA | February 22, 2004

abstract

Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements using edge thresholds do not apply. In fact, in this paper we present evidence that optics can be used to image and measure features as small as 10 nm in dimension, well below the imaging wavelength. To understand the limits of optical methods we have extensively studied both linewidth and overlay metrology applications. Although overlay applications are usually thought to involve pitch or centerline measurements of features from different process levels, some target designs present optical proximity effects which pose a significant challenge. Likewise, line width measurements require determination of the physical edges and geometry which created that profile. Both types of measurements require model-based analysis to accurately evaluate the data and images. In this paper we explore methods to optimize target geometry, optical configurations, structured illumination, and analysis algorithms with applications in both critical dimension and overlay metrology.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Richard M. Silver ; Ravikiran Attota ; Michael Stocker ; Michael Bishop ; Jau-Shi J. Jun, et al.
"High-resolution optical overlay metrology", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, 78 (May 24, 2004); doi:10.1117/12.539028; http://dx.doi.org/10.1117/12.539028


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.