A series of experiments were performed to determine if the ThermaWave INTEGRA CCDi reflectometer combined with Timbre Technologies" Optical Digital Profiler (ODP) software could meet the requirements for lithography cell integration and process control of critical 0.13-micron Flash memory applications. Shallow Trench Isolation (STI), First Poly Gate, Stacked Gate and Aluminum Interconnect layers were examined as a part of this study. ODP models were developed for each of these applications and their output was compared to Critical Dimension Scanning Electron Microscopy (CDSEM) and cross-section SEM to demonstrate adequate correlation to incumbent metrology techniques. ODP is shown herein to correlate to CDSEM while providing the throughput required to measure every wafer without creating a bottleneck for the lithography cell. Experimental results also suggest that, in many cases, ODP can deliver profile determination beyond the fundamental capability of standard in-line metrology techniques.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.