Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Benefiting from polarization effects on high-NA imaging

[+] Author Affiliations
Bruce W. Smith, Lena V. Zavyalova, Andrew Estroff

Rochester Institute of Technology (USA)

Proc. SPIE 5377, Optical Microlithography XVII, 68 (May 28, 2004); doi:10.1117/12.537266
Text Size: A A A
From Conference Volume 5377

  • Optical Microlithography XVII
  • Bruce W. Smith
  • Santa Clara, CA | February 22, 2004

abstract

The onset of lithographic technology involving extreme numerical aperture (NA) values introduces critical technical issues that are now receiving particular attention. Projection lithography with NA values above 0.90 is necessary for future generation devices. The introduction of immersion lithography enables even larger angles, resulting in NA values of 1.2 and above. The imaging effects from oblique angles, electric field polarization, optical interference, optical reflection, and aberration can be significant. This paper addresses polarization considerations at critical locations in the optical path of a projection system, namely in the illuminator, at the mask, and in the photoresist. Several issues are addressed including TE and azimuthal polarized illumination, wire grid polarization effects for real thin film mask materials, and multilayer resist AR coatings for high NA and polarization.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Bruce W. Smith ; Lena V. Zavyalova and Andrew Estroff
"Benefiting from polarization effects on high-NA imaging", Proc. SPIE 5377, Optical Microlithography XVII, 68 (May 28, 2004); doi:10.1117/12.537266; http://dx.doi.org/10.1117/12.537266


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.