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Proceedings Article

OML: optical maskless lithography for economic design prototyping and small-volume production

[+] Author Affiliations
Tor Sandstrom

Micronic Laser Systems AB (Sweden)

Arno Bleeker, Jason Hintersteiner, Kars Troost, Karel van der Mast

ASML (Netherlands)

Jorge Freyer

Micronic Laser Systems Inc. (Sweden)

Proc. SPIE 5377, Optical Microlithography XVII, 777 (May 28, 2004); doi:10.1117/12.537391
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From Conference Volume 5377

  • Optical Microlithography XVII
  • Bruce W. Smith
  • Santa Clara, CA | February 22, 2004

abstract

The business case for Maskless Lithography is more compelling than ever before, due to more critical processes, rising mask costs and shorter product cycles. The economics of Maskless Lithography gives a crossover volume from Maskless to mask-based lithography at surprisingly many wafers per mask for surprisingly few wafers per hour throughput. Also, small-volume production will in many cases be more economical with Maskless Lithography, even when compared to "shuttle" schemes, reticles with multiple layers, etc. The full benefit of Maskless Lithography is only achievable by duplicating processes that are compatible with volume production processes on conventional scanners. This can be accomplished by the integration of pattern generators based on spatial light modulator technology with state-of-the-art optical scanner systems. This paper reports on the system design of an Optical Maskless Scanner in development by ASML and Micronic: small-field optics with high demagnification, variable NA and illumination schemes, spatial light modulators with millions of MEMS mirrors on CMOS drivers, a data path with a sustained data flow of more than 250 GPixels per second, stitching of sub-fields to scanner fields, and rasterization and writing strategies for throughput and good image fidelity. Predicted lithographic performance based on image simulations is also shown.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Tor Sandstrom ; Arno Bleeker ; Jason Hintersteiner ; Kars Troost ; Jorge Freyer, et al.
"OML: optical maskless lithography for economic design prototyping and small-volume production", Proc. SPIE 5377, Optical Microlithography XVII, 777 (May 28, 2004); doi:10.1117/12.537391; http://dx.doi.org/10.1117/12.537391


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