Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Full optical column characterization of DUV lithographic projection tools

[+] Author Affiliations
Mark A. van de Kerkhof, Wim de Boeij, Haico Kok, Marianna Silova, Jan Baselmans, Marcel Hemerik

ASML (Netherlands)

Proc. SPIE 5377, Optical Microlithography XVII, 1960 (May 28, 2004); doi:10.1117/12.536331
Text Size: A A A
From Conference Volume 5377

  • Optical Microlithography XVII
  • Bruce W. Smith
  • Santa Clara, CA | February 22, 2004

abstract

Advanced optical systems for low k1 lithography require accurate characterisation of various imaging parameters to insure that OPC strategies can be maintained. Among these parameters lens aberrations and illumination profiles are the most important optical column charcteristics. The phase measurement interferometer hardware (ILIAS: Integrated Lens Interferometer At Scanner) integrated into high-NA ArF lithographic projection tools opens novel pathways to measure and control tool critical performance parameters. In this presentation we address new extensions of this in-line tool that will allow the measurement of optical parameters of the full optical column. The primary functionality of the ILIAS system is to measure and analyse wavefront aberrations across the full image field with high accuracy and speed. In this paper performance data of the in-line wavefront sensor over multiple high-NA ArF lithographic systems is presented. In addition to the acquisition of wavefront aberrations in terms of Zernike polynomials, detailed measurements of high resolution wavefronts are now possible. Examples of such wavefronts and PSD analysis thereof are presented. Besides the projection lens properties, the detailed shape of the pupil distribution and transmission (apodisation) becomes critical for system optimization. The integrated ILIAS hardware can also be used to measure these parameters.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Mark A. van de Kerkhof ; Wim de Boeij ; Haico Kok ; Marianna Silova ; Jan Baselmans, et al.
"Full optical column characterization of DUV lithographic projection tools", Proc. SPIE 5377, Optical Microlithography XVII, 1960 (May 28, 2004); doi:10.1117/12.536331; http://dx.doi.org/10.1117/12.536331


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.