Effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight

Andrey A. Zhukov; Svetlana A. Zhukova; Galina A. Korneeva; Yury S. Tchetverov

doi:10.1117/12.552210

1 March 2004 Effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight

Andrey A. Zhukov, Svetlana A. Zhukova, Galina A. Korneeva, Yury S. Tchetverov

Author Affiliations +

Proceedings Volume 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics; (2004) https://doi.org/10.1117/12.552210
Event: Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 2003, Moscow, Russian Federation

Abstract

The relationship between the rate of plasma-chemical etching of coatings and the molecular weight of polyamidoacid, made from pyrromelite dianhydride and dianiline oxide, and the chemical composition of polyimides is studied. It has been shown by IR spectroscopy that plasma-chemical etching does not produced any chemeical transformation in the bulk of totally imidized coatings. The improvement of adhesion characteristics of the PMDA-ODA coating materials is revealed.

Citation Download Citation

Andrey A. Zhukov, Svetlana A. Zhukova, Galina A. Korneeva, and Yury S. Tchetverov "Effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight", Proc. SPIE 5398, Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics, (1 March 2004); https://doi.org/10.1117/12.552210

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