Recent CD accuracy improvements for HL-7000M

Zhigang Wang; Hidetoshi Satoh; Hiroyuki Ito; Yasunari Sohda; Hiroya Ohta; Hajime Kawano; Yasuhiro Kadowaki; Kazui Mizuno; Takashi Matsuzaka

doi:10.1117/12.557807

20 August 2004 Recent CD accuracy improvements for HL-7000M

Zhigang Wang, Hidetoshi Satoh, Hiroyuki Ito, Yasunari Sohda, Hiroya Ohta, Hajime Kawano, Yasuhiro Kadowaki, Kazui Mizuno, Takashi Matsuzaka

Author Affiliations +

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557807
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

A new electron beam mask writer, HL-7000M, has been developed for mass production of 90 nm node photomask and, research and development of 65 nm node mask. A series of adjustments to improve CD accuracy provides us a novel systematic solution for VSB system optimization. By applying a novel constant-gain method for linearity adjustment, linearity range, for designed size ranging from 0.3 um to 1.0 um, has been improved to < 3 nm for line and space pattern, the maximum XY discrepancy is 2 nm. Both experimental and theoretical studies for shot-divided patterns, which are often generated in OPC pattern conversion, have been applied. By modification of the shift term in beam size correction, exposure results for such shot-divided patterns, for divided pattern size varied from 500 nm to 1 nm, are improved to be less than 5 nm in range.

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Zhigang Wang, Hidetoshi Satoh, Hiroyuki Ito, Yasunari Sohda, Hiroya Ohta, Hajime Kawano, Yasuhiro Kadowaki, Kazui Mizuno, and Takashi Matsuzaka "Recent CD accuracy improvements for HL-7000M", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557807

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