Paper
10 June 2004 Emission spectra of laser-produced plasmas for EUV and soft x-ray sources
Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo
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Abstract
The plasma emission of tin, aluminum and cupper targets irradiated with laser intensities ranging from 1011 to 1016 W/cm2 has been measured beween 7nm and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790- nm with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 nm with 10 ns pulse duration (fwhm) have been used. The observed plasma emission was strongest for the 300 ps laser pulse irradiation, which might be due to the additional laser plasma heating during plasma formation.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, and Akira Endo "Emission spectra of laser-produced plasmas for EUV and soft x-ray sources", Proc. SPIE 5482, Laser Optics 2003: Superintense Light Fields and Ultrafast Processes, (10 June 2004); https://doi.org/10.1117/12.558598
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KEYWORDS
Plasmas

Picosecond phenomena

Pulsed laser operation

Aluminum

Extreme ultraviolet

Tin

Copper

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