Quantitative optical metrology with CMOS cameras

Cosme Furlong; Ervin Kolenovic; Curtis F. Ferguson

doi:10.1117/12.562788

2 August 2004 Quantitative optical metrology with CMOS cameras

Cosme Furlong, Ervin Kolenovic, Curtis F. Ferguson

Proceedings Volume 5532, Interferometry XII: Applications; (2004) https://doi.org/10.1117/12.562788
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

Recent advances in laser technology, optical sensing, and computer processing of data, have lead to the development of advanced quantitative optical metrology techniques for high accuracy measurements of absolute shapes and deformations of objects. These techniques provide noninvasive, remote, and full field of view information about the objects of interest. The information obtained relates to changes in shape and/or size of the objects, characterizes anomalies, and provides tools to enhance fabrication processes. Factors that influence selection and applicability of an optical technique include the required sensitivity, accuracy, and precision that are necessary for a particular application. In this paper, sensitivity, accuracy, and precision characteristics in quantitative optical metrology techniques, and specifically in optoelectronic holography (OEH) based on CMOS cameras, are discussed. Sensitivity, accuracy, and precision are investigated with the aid of National Institute of Standards and Technology (NIST) traceable gauges, demonstrating the applicability of CMOS cameras in quantitative optical metrology techniques. It is shown that the advanced nature of CMOS technology can be applied to challenging engineering applications, including the study of rapidly evolving phenomena occurring in MEMS and micromechatronics.

Citation Download Citation

Cosme Furlong, Ervin Kolenovic, and Curtis F. Ferguson "Quantitative optical metrology with CMOS cameras", Proc. SPIE 5532, Interferometry XII: Applications, (2 August 2004); https://doi.org/10.1117/12.562788

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