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Proceedings Article

Recent progress of EUV wavefront metrology in EUVA

[+] Author Affiliations
Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito

Extreme Ultraviolet Lithography System Development Association (Japan)

Masahito Niibe

Univ. of Hyogo (Japan)

Mitsuo Takeda

Univ. of Electrocommunications (Japan)

Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, 27 (October 18, 2004); doi:10.1117/12.562431
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From Conference Volume 5533

  • Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
  • Ali M. Khounsary; Udo Dinger; Kazuya Ota
  • Denver, CO | August 02, 2004

abstract

The recent experimental results of EUV wavefront metrology in EUVA are reported. EUV Experimental Interferometer (EEI) was built at the NewSUBARU synchrotron facility of University of Hyogo to develop the most suitable wavefront measuring method for EUV projection optics. The result is to be reflected on EWMS (EUV Wavefront Metrology System) that measures wavefront aberrations of a six-aspherical mirror projection optics of NA0.25, of a mass-production EUV lithography tool. The experimental results of Point Diffraction Interferometer (PDI) and Lateral Shearing Interferometer (LSI) are shown and the error factors and the sensitivity of astigmatism measurements of these methods are discussed. Furthermore, for reducing these kinds of errors, another type of shearing interferometer called DTI (Digital Talbot interferometer) is newly introduced.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Masanobu Hasegawa ; Chidane Ouchi ; Takayuki Hasegawa ; Seima Kato ; Akinori Ohkubo, et al.
"Recent progress of EUV wavefront metrology in EUVA", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, 27 (October 18, 2004); doi:10.1117/12.562431; http://dx.doi.org/10.1117/12.562431


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