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Proceedings Article

Diagnostics for laser plasma EUV sources

[+] Author Affiliations
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, C. Keyser, Robert Bernath, Simi George, Somsak Teerawattanasook

College of Optics and Photonics/Univ. of Central Florida (USA)

Proc. SPIE 5580, 26th International Congress on High-Speed Photography and Photonics, 434 (March 25, 2005); doi:10.1117/12.597349
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From Conference Volume 5580

  • 26th International Congress on High-Speed Photography and Photonics
  • Dennis L. Paisley; Stuart Kleinfelder; Donald R. Snyder; Brian J. Thompson
  • Alexandria, VA | September 19, 2004

abstract

A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the principal diagnostics of the EUV radiation that are now being utilized in the metrology, spectroscopy and imaging of these sources.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Martin C. Richardson ; Chiew-Seng Koay ; Kazutoshi Takenoshita ; C. Keyser ; Robert Bernath, et al.
"Diagnostics for laser plasma EUV sources", Proc. SPIE 5580, 26th International Congress on High-Speed Photography and Photonics, 434 (March 25, 2005); doi:10.1117/12.597349; http://dx.doi.org/10.1117/12.597349


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