Microdomains control in quasi-stoichiometric LiNbO3 wafers

Federico Caccavale; David Callejo; Costanza Dragoni; Alessandro Morbiato; Mario Musolino; Massimiliano Properzi

doi:10.1117/12.578239

16 December 2004 Microdomains control in quasi-stoichiometric LiNbO₃ wafers

Federico Caccavale, David Callejo, Costanza Dragoni, Alessandro Morbiato, Mario Musolino, Massimiliano Properzi

Proceedings Volume 5621, Optical Materials in Defence Systems Technology; (2004) https://doi.org/10.1117/12.578239
Event: European Symposium on Optics and Photonics for Defence and Security, 2004, London, United Kingdom

Abstract

In this work is presented a study on the surface microdomain formation in quasi-SLN Z-cut 3" crystals, with an accurate control on both the composition and on the wafering process. The UV absorption edge has been measured and correlated with the crystal composition, showing the edge shift towards shorter wavelengths. The coercive field has been measured as a function of temperature and it has been found lower in the quasi-SLN substrate if compared with the congruent crystals. The microdomain formation at wafer level can be controlled and avoided by appropriate composition choice as well as wafer mechanical and thermal treatments, and is checked by chemical etching and subsequent optical inspection. It has been found that quasi-SLN crystals with 49.82 Li₂O mol% content could present microdomains formation even after the photoresist process. On the other side, quasi-SLN crystals with 49.72 Li₂O mol% content seem to be more stable for both photoresist and Ti diffusion process for waveguide fabrication. A careful control on LiNbO₃ composition and wafer surface quality allows one to find the proper compositional window for the realization of various advanced optical and electro-optical devices.

Citation Download Citation

Federico Caccavale, David Callejo, Costanza Dragoni, Alessandro Morbiato, Mario Musolino, and Massimiliano Properzi "Microdomains control in quasi-stoichiometric LiNbO₃ wafers", Proc. SPIE 5621, Optical Materials in Defence Systems Technology, (16 December 2004); https://doi.org/10.1117/12.578239

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