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Proceedings Article

Lithography simulation in semiconductor manufacturing

[+] Author Affiliations
Chris A. Mack

KLA-Tencor Corp. (USA)

Proc. SPIE 5645, Advanced Microlithography Technologies, 63 (February 28, 2005); doi:10.1117/12.584441
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From Conference Volume 5645

  • Advanced Microlithography Technologies
  • Yangyuan Wang; Jun-en Yao; Christopher J. Progler
  • Beijing, China | November 08, 2004

abstract

In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how simulators have been used and are soon to be used in semiconductor manufacturing flows. This review paper will describe the most popular and useful examples today for lithography simulators in a manufacturing environment.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Chris A. Mack
"Lithography simulation in semiconductor manufacturing", Proc. SPIE 5645, Advanced Microlithography Technologies, 63 (February 28, 2005); doi:10.1117/12.584441; http://dx.doi.org/10.1117/12.584441


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