Coma measurement by transmission image sensor with a PSM

Fan Wang; Xiangzhao Wang; Mingying Ma; Dongqing Zhang; Weijie Shi; Jianming Hu

doi:10.1117/12.573642

27 January 2005 Coma measurement by transmission image sensor with a PSM

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, Jianming Hu

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.573642
Event: Photonics Asia, 2004, Beijing, China

Abstract

As feature size decreases, especially with the use of resolution enhancement technique such as off axis illumination and phase shifting mask, fast and accurate in-situ measurement of coma has become very important in improving the performance of modern lithographic tools. The measurement of coma can be achieved by the transmission image sensor, which is an aerial image measurement device. The coma can be determined by measuring the positions of the aerial image at multiple illumination settings. In the present paper, we improve the measurement accuracy of the above technique with an alternating phase shifting mask. Using the scalar diffraction theory, we analyze the effect of coma on the aerial image. To analyze the effect of the alternating phase shifting mask, we compare the pupil filling of the mark used in the above technique with that of the phase-shifted mark used in the new technique. We calculate the coma-induced image displacements of the marks at multiple partial coherence and NA settings, using the PROLITH simulation program. The simulation results show that the accuracy of coma measurement can increase approximately 20 percent using the alternating phase shifting mask.

Citation Download Citation

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, and Jianming Hu "Coma measurement by transmission image sensor with a PSM", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.573642

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