Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application

J. Earl Rudisill; Angela Dupparre; Sven Schroeder

doi:10.1117/12.584743

21 February 2005 Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application

J. Earl Rudisill, Angela Dupparre, Sven Schroeder

Author Affiliations +

Proceedings Volume 5647, Laser-Induced Damage in Optical Materials: 2004; (2005) https://doi.org/10.1117/12.584743
Event: Boulder Damage Symposium XXXVI, 2004, Boulder, Colorado, United States

Abstract

The complete evaluation in the selection of coating designs for production of high performance mirrors must include the scattering losses that are associated with the thin film materials combination. This is especially true for deep ultraviolet [DUV] microlithography applications. Scattering loss data are presented at 193 nm for various coating material designs for operation in argon fluoride laser systems. For overall optimum performance tradeoffs of the spectral reflectance, environmental stability and pulsed laser irradiation lifetime survivability is also discussed.

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J. Earl Rudisill, Angela Dupparre, and Sven Schroeder "Determination of scattering losses in ArF* excimer laser all-dielectric mirrors for 193 nm microlithography application", Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); https://doi.org/10.1117/12.584743

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