Enhancement of surface damage resistance by selective chemical removal of CeO<sub>2</sub>

Tomosumi Kamimura; Shinji Motokoshi; Takayasu Sakamoto; Takahisa Jitsuno; Haruya Shiba; Shigenori Akamatsu; Hideo Horibe; Takayuki Okamoto; Kunio Yoshida

doi:10.1117/12.585219

21 February 2005 Enhancement of surface damage resistance by selective chemical removal of CeO₂

Tomosumi Kamimura, Shinji Motokoshi, Takayasu Sakamoto, Takahisa Jitsuno, Haruya Shiba, Shigenori Akamatsu, Hideo Horibe, Takayuki Okamoto, Kunio Yoshida

Author Affiliations +

Proceedings Volume 5647, Laser-Induced Damage in Optical Materials: 2004; (2005) https://doi.org/10.1117/12.585219
Event: Boulder Damage Symposium XXXVI, 2004, Boulder, Colorado, United States

Abstract

The laser-induced damage threshold of polished fused silica surfaces is much lower than the damage threshod of its bulk. It is well known that contaminations of polished surface are one of the causes of low threshold of laser-induced surface damage. Particularly, polishing contamination such as cerium dioxide (CeO₂) compound used in optical polishing process is embedded inside the surface layer, and cannot be removed by conventional cleaning. For the enhancement of surface damage resistance, various surface treatments have been applied to the removal of embedded polishing compound. In this paper, we propose a new method using slective chemical removal with high-temperature sulfuric acid (H₂SO₄). Sulfuric acid could dissolve only CeO₂ from the fused silica surface. The surface roughness of fused silica treated H₂SO₄ was kept through the treatment process. At the wavelength of 355 nm, the surface damage threshold was drastically improved to the nearly same as bulk quality. However, the effect of our treatment was not observed at the wavelength of 1064 nm. The comparison with our previous results obtained from other surface treatments will be discussed.

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Tomosumi Kamimura, Shinji Motokoshi, Takayasu Sakamoto, Takahisa Jitsuno, Haruya Shiba, Shigenori Akamatsu, Hideo Horibe, Takayuki Okamoto, and Kunio Yoshida "Enhancement of surface damage resistance by selective chemical removal of CeO₂", Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); https://doi.org/10.1117/12.585219

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