Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser

Sangjin Kwon; Won-Seok Chang; Sungho Jeong

doi:10.1117/12.595819

8 October 2004 Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser

Sangjin Kwon, Won-Seok Chang, Sungho Jeong

Author Affiliations +

Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.595819
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan

Abstract

Nanopatterning on the surface of a spin-coated photoresist using a near-field scanning optical microscope (NSOM) is investigated. A cantilever type nanoprobe whose aperture diameter is approximately 100 nm is installed on the NSOM to produce the nanopatterns. The optical near-field at the tip of the nanoprobe is produced by focusing the light from a He-Cd laser on the entrance side of the nanoprobe. The variation of pattern size are examined with respect to process parameters such as laser beam power, scan speed of the nanoprobe, and thickness of the coated photoresist. The linewidth of nanopatterns reduces for decreasing laser power and increasing scan speed. Using this method, about 200 nm size nanopatterns are produced. Fabrication of a two-dimensional nanopattern of arbitrary shape is demonstrated.

Citation Download Citation

Sangjin Kwon, Won-Seok Chang, and Sungho Jeong "Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); https://doi.org/10.1117/12.595819

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