Paper
22 January 2005 Fabrication of 3D microstructure and analysis of voxel generation by ultrafast-laser-induced two-photon absorption
Shin Wook Yi, Seong Ku Lee, Mi Jung Cho, Hong Jin Kong, Dong-Yol Yang, Sang-hu Park, Tae-woo Lim, Ran Hee Kim, Kwang-Sup Lee
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Abstract
Multi-photon absorption phenomena induced by ultra fast laser have been considered for many applications of microfabrications such as metal ablation, glass etching and photopolymerization. Among the applications, the photopolymerization by two-photon absorption (TPA) has been regarded as a new microfabricating method. It is possible to be used in photo mask correcting, diffractive optical element and micro machining. The TPA photopolymerization is made possible to fabricate a complicated three dimensional (3D) micro-structure which the conventional photomask technology has not been able to make. In fact, the shape of the voxel (volume pixel: a unit structure of TPA fabrication) is an important factor which could affect the microfabrication process. In this paper, we have reported that 3D micro-structures were fabricated and the generation of voxel shape was analyzed for various optical conditions.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shin Wook Yi, Seong Ku Lee, Mi Jung Cho, Hong Jin Kong, Dong-Yol Yang, Sang-hu Park, Tae-woo Lim, Ran Hee Kim, and Kwang-Sup Lee "Fabrication of 3D microstructure and analysis of voxel generation by ultrafast-laser-induced two-photon absorption", Proc. SPIE 5715, Micromachining and Microfabrication Process Technology X, (22 January 2005); https://doi.org/10.1117/12.590381
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Cited by 5 scholarly publications.
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KEYWORDS
Absorption

Microfabrication

Photopolymerization

Raster graphics

Diffractive optical elements

Polymerization

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