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Proceedings Article

Oxidation resistance of Ru-capped EUV multilayers

[+] Author Affiliations
Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey C. Robinson, John S. Taylor

Lawrence Livermore National Lab. (USA)

Miles Clift

Sandia National Labs. (USA)

Andy Aquila, Eric M. Gullikson

Lawrence Berkeley National Lab. (USA)

N. V. Ginger Edwards

SEMATECH (USA)

Proc. SPIE 5751, Emerging Lithographic Technologies IX, 118 (May 6, 2005); doi:10.1117/12.597443
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From Conference Volume 5751

  • Emerging Lithographic Technologies IX
  • R. Scott Mackay
  • San Jose, CA | February 27, 2005

abstract

Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Sasa Bajt ; Zu Rong Dai ; Erik J. Nelson ; Mark A. Wall ; Jennifer Alameda, et al.
"Oxidation resistance of Ru-capped EUV multilayers", Proc. SPIE 5751, Emerging Lithographic Technologies IX, 118 (May 6, 2005); doi:10.1117/12.597443; http://dx.doi.org/10.1117/12.597443


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