Oxidation resistance of Ru-capped EUV multilayers

Sasa Bajt; Zu Rong Dai; Erik J. Nelson; Mark A. Wall; Jennifer Alameda; Nhan Nguyen; Sherry Baker; Jeffrey C. Robinson; John S. Taylor; Miles Clift; Andy Aquila; Eric M. Gullikson; N. V. Ginger Edwards

doi:10.1117/12.597443

6 May 2005 Oxidation resistance of Ru-capped EUV multilayers

Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey C. Robinson, John S. Taylor, Miles Clift, Andy Aquila, Eric M. Gullikson, N. V. Ginger Edwards

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.597443
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.

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Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey C. Robinson, John S. Taylor, Miles Clift, Andy Aquila, Eric M. Gullikson, and N. V. Ginger Edwards "Oxidation resistance of Ru-capped EUV multilayers", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.597443

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