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Proceedings Article

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

[+] Author Affiliations
Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin Richardson, Vivek Bakshi

CREOL and FPCE, College of Optics and Photonics/Univ. of Central Florida (USA)

Proc. SPIE 5751, Emerging Lithographic Technologies IX, 279 (May 6, 2005); doi:10.1117/12.596753
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From Conference Volume 5751

  • Emerging Lithographic Technologies IX
  • R. Scott Mackay
  • San Jose, CA | February 27, 2005

abstract

Light sources based on laser plasmas using tin as target material are known to provide high conversion efficiency of laser power to emission in the 13.5 nm spectral region. In addition, laser plasmas produced from microscopic droplet targets enable the utilization of the mass-limited concept which minimizes the effect of target debris produced from the laser plasma interaction. By combining the mass-limited target concept and tin as the choice of target material, we are developing an extreme-ultraviolet (EUV) light source that can supply high power while remaining essentially debris-free. This source uses tin-doped microscopic droplet liquid targets that are generated at high-repetition rates (>30 kHz), which allows convenient upward power scaling when coupled with a high averaged-power laser. Detailed studies of the radiation from this source have been made using a precision Nd:YAG laser. Broad parametric studies of the conversion efficiency along with in-band spectroscopy of this EUV source have been performed. The parametric dependence of conversion efficiency is established based on measurements made by the Flying Circus diagnostic tool and a calibrated high-resolution flat-field spectrometer. These measurements have been independently confirmed by the Flying Circus 2 team.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Chiew-Seng Koay ; Simi George ; Kazutoshi Takenoshita ; Robert Bernath ; Etsuo Fujiwara, et al.
"High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL", Proc. SPIE 5751, Emerging Lithographic Technologies IX, 279 (May 6, 2005); doi:10.1117/12.596753; http://dx.doi.org/10.1117/12.596753


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