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Proceedings Article

Application of through-focus focus-metric analysis in high resolution optical metrology

[+] Author Affiliations
Ravikiran Attota, Richard M. Silver, Thomas A. Germer, Robert Larrabee, Michael T. Stocker, Lowel Howard

National Institute of Standards and Technology (USA)

Michael Bishop

International SEMATECH (USA)

Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, 1441 (June 21, 2005); doi:10.1117/12.621106
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From Conference Volume 5752

  • Metrology, Inspection, and Process Control for Microlithography XIX
  • Richard M. Silver
  • San Jose, CA | February 27, 2005

abstract

The optical image of a structured target, where a particular structure repeats itself several times, varies greatly as it is moved through focus if the spacing between the structures is such that the scattered field from the edges interferes. This condition results in a different and complex optical response compared to that found for structures much farther apart. The complex optical image of a structured target in the proximity region is sensitive to the dimensions of the target and the optical parameters. By appropriately analyzing the through-focus optical image, information can be obtained regarding the target and the optical system. In the present work an array of lines is used as a structured target. Experimental data were obtained using a bright field microscope, and results were simulated using a 'modal diffraction grating model' (also known as a rigorous coupled-wave analysis (RCWA)). The gradient-energy focus-metric method was used to characterize the through-focus optical response. The resultant focus metric signature is sensitive to changes in the line width in the nanometer range, giving it potential for metrology applications and characterization of optical tools.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Ravikiran Attota ; Richard M. Silver ; Thomas A. Germer ; Michael Bishop ; Robert Larrabee, et al.
"Application of through-focus focus-metric analysis in high resolution optical metrology", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, 1441 (June 21, 2005); doi:10.1117/12.621106; http://dx.doi.org/10.1117/12.621106


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