Paper
12 May 2005 High refractive index immersion fluids for 193 nm immersion lithography
Bridgette Budhlall, Gene Parris, Peng Zhang, Xiaoping Gao, Zarka Zarkov, Brenda Ross, Simon Kaplan, John Burnett
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Abstract
For the next-generation immersion lithography technology, there is a growing interest in the immersion fluids having a refractive index larger than 1.5 and low absorbance at 193nm wavelength. In this paper, we report our effort in identifying new immersion fluid candidates. The absolute refractive index values and thermo-optic coefficients, dn/dT, were measured with 1x10-4 and 1x10-5 accuracy respectively at 193nm wavelength. The results showed promising candidates having refractive index ranging from 1.5 to 1.65 with low absorbance at 193nm wavelength. Preliminary imaging results with a new immersion fluid gave good 65nm Line/Space patterns. However, the minimum exposure time of 20sec is about ten times as needed for water, indicating the need to further reduce the absorbance of the immersion fluid.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bridgette Budhlall, Gene Parris, Peng Zhang, Xiaoping Gao, Zarka Zarkov, Brenda Ross, Simon Kaplan, and John Burnett "High refractive index immersion fluids for 193 nm immersion lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600025
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CITATIONS
Cited by 10 scholarly publications and 5 patents.
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KEYWORDS
Refractive index

Absorbance

Water

Photoresist materials

Immersion lithography

Absorption

Microfluidics

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