Development of fluoropolymers for pellicle in 157nm lithography

Shinji Okada; Hiromasa Yamamoto; Ikuo Matsukura; Naoko Shirota; Yuichirou Ishibashi; Hironao Sasaki; Iwao Higashikawa; Wataru Wakamiya

doi:10.1117/12.599311

12 May 2005 Development of fluoropolymers for pellicle in 157nm lithography

Shinji Okada, Hiromasa Yamamoto, Ikuo Matsukura, Naoko Shirota, Yuichirou Ishibashi, Hironao Sasaki, Iwao Higashikawa, Wataru Wakamiya

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.599311
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Fluoropolymers have been successfully utilized for pellicle manufacturing in 248 and 193nm lithography. Moreover, the pellicle using such fluoropolymers will make a large contribution to the development of 193nm immersion technology that is now expected as NGL for 65nm and 45nm node. On the other hand, 157nm lithography is also considered to be a desirable solution as a future manufacturing technique. However, no fluoropolymers show good laser durability to 157nm irradiation. This is one of major obstacles for implementing 157nm lithography. It follows that the purpose of this research is to find out a polymer that has outstanding durability, and would therefore promote wider use of the 157nm technology. Through this research, we had synthesized some kinds of fluoropolymer platform and investigated their durability. From the investigation, we have found several criteria to control their photo-induced degradation. Based upon these criteria, we have synthesized several new fluoropolymers and investigated their durability. As the result of these evaluations, these polymers showed good initial transmission as expected. Moreover, some polymers showed good mechanical durability when exposed to over 100J/cm² irradiation. In addition, some new copolymers between monomer containing tert-hydrogen and perfluorinated monomer showed poor mechanical durability, however the polymers showed higher transparency during irradiation. To investigate these phenomena, we have analyzed these polymers using FT-IR and XPS. From these analyses, we estimate and propose possible degradation mechanism of these polymers.

Citation Download Citation

Shinji Okada, Hiromasa Yamamoto, Ikuo Matsukura, Naoko Shirota, Yuichirou Ishibashi, Hironao Sasaki, Iwao Higashikawa, and Wataru Wakamiya "Development of fluoropolymers for pellicle in 157nm lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.599311

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available