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Proceedings Article

Laser irradiation, ion implantation, and e-beam writing of integrated optical structures

[+] Author Affiliations
Giancarlo C. Righini, S. Berneschi, M. Brenci, G. Nunzi Conti, S. Pelli, S. Sebastiani

Nello Carrara Institute of Applied Physics, CNR (Italy)

I. Banyasz

Institute of Solid State Physics and Optics (Hungary)

A. Chiasera, M. Ferrari

Institute of Photonics and Nanotechnologies, CNR (Italy)

M. Cremona

PUC-Rio (Brazil)

D. Ehrt

Friedrich-Schiller-Univ. Jena (Germany)

R. M. Montereali

ENEA (Italy)

C. Tosello

Univ. of Trento (Italy)

Proc. SPIE 5840, Photonic Materials, Devices, and Applications, 649 (July 7, 2005); doi:10.1117/12.609231
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From Conference Volume 5840

  • Photonic Materials, Devices, and Applications
  • Goncal Badenes; Derek Abbott; Ali Serpenguzel
  • Sevilla, Spain | May 09, 2005

abstract

Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride, uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Giancarlo C. Righini ; I. Banyasz ; S. Berneschi ; M. Brenci ; A. Chiasera, et al.
"Laser irradiation, ion implantation, and e-beam writing of integrated optical structures", Proc. SPIE 5840, Photonic Materials, Devices, and Applications, 649 (July 7, 2005); doi:10.1117/12.609231; http://dx.doi.org/10.1117/12.609231


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