Laser-array generators produced by patterned ion irradiation of acrylic films

Brian G. Hoover; Chase K. McMichael; Lowell T. Wood; Zuhua Zhang; Jia-Rui Liu; Wei-Kan Chu

doi:10.1117/12.619144

30 August 2005 Laser-array generators produced by patterned ion irradiation of acrylic films

Brian G. Hoover, Chase K. McMichael, Lowell T. Wood, Zuhua Zhang, Jia-Rui Liu, Wei-Kan Chu

Proceedings Volume 5897, Photonics for Space Environments X; 589706 (2005) https://doi.org/10.1117/12.619144
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Ion irradiation of polymer films is a promising process technology for photonics applications that require flexible, lightweight devices resistant to selected environmental variables. Crossed phase gratings that may serve as laser-beam array generators are fabricated using the dry process of irradiation of acrylic (PMMA) films with various doses of high-energy alpha particles through a stencil mask. The gratings are examined with the aid of AFM and SEM images, and Raman-Nath diffraction analysis is applied to estimate the generated refractive-index modulation as a function of the dose. SEM images of a stained grating cross-section suggest a mechanism of unsaturated bond formation and accompanying contraction of the irradiated polymer. Post-irradiation baking is shown to increase the contraction or generated surface relief by around an order of magnitude. Since the index modulation and surface relief due to irradiation tend to cancel, the overall diffraction effciencies of unbaked gratings do not surpass 67%, although baked gratings can provide higher diffraction effciencies.

Citation Download Citation

Brian G. Hoover, Chase K. McMichael, Lowell T. Wood, Zuhua Zhang, Jia-Rui Liu, and Wei-Kan Chu "Laser-array generators produced by patterned ion irradiation of acrylic films", Proc. SPIE 5897, Photonics for Space Environments X, 589706 (30 August 2005); https://doi.org/10.1117/12.619144

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