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Proceedings Article

Shaping of thin grazing-incidence reflection grating substrates via magnetorheological finishing

[+] Author Affiliations
Ralf K. Heilmann, Mireille Akilian, Chi-Hao Chang, Mark L. Schattenburg

Massachusetts Institute of Technology

Robert Hallock, Ed Cleaveland

QED Technologies

Proc. SPIE 5900, Optics for EUV, X-Ray, and Gamma-Ray Astronomy II, 590009 (September 08, 2005); doi:10.1117/12.617788
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From Conference Volume 5900

  • Optics for EUV, X-Ray, and Gamma-Ray Astronomy II
  • Oberto Citterio; Stephen L. O'Dell
  • San Diego, California, United States | July 31, 2005

abstract

Reflection gratings offer high dispersion and thus the potential for high spectral resolution in the soft x-ray band. The requirements of high efficiency and maximum collecting area at minimum mass lead to the desire for densely stacked and exquisitely flat thin-foil grating substrates. In the past we have successfully addressed the problems of thin substrate figure metrology and blazed grating profile fabrication. Our recently developed low-stress thin-foil metrology truss with 50 nm figure repeatability removed a metrology bottleneck and allows us to make progress in the shaping of thin-foil substrates. We present results on the figuring of 100 mm-diameter silicon wafers via magnetorheological finishing to a flatness below 100 nm peak-to-valley, allowing for sub-arcsecond reflection optics.

© (2005) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Ralf K. Heilmann ; Mireille Akilian ; Chi-Hao Chang ; Robert Hallock ; Ed Cleaveland, et al.
"Shaping of thin grazing-incidence reflection grating substrates via magnetorheological finishing", Proc. SPIE 5900, Optics for EUV, X-Ray, and Gamma-Ray Astronomy II, 590009 (September 08, 2005); doi:10.1117/12.617788; http://dx.doi.org/10.1117/12.617788


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