Effects of halogen doping on structure of silica glass as a photonic material

Hiroshi Kakiuchida; Kazuya Saito; Noriyuki Hiramitsu; Akira J. Ikushima

doi:10.1117/12.474295

17 February 2003 Effects of halogen doping on structure of silica glass as a photonic material

Hiroshi Kakiuchida, Kazuya Saito, Noriyuki Hiramitsu, Akira J. Ikushima

Proceedings Volume 4833, Applications of Photonic Technology 5; (2003) https://doi.org/10.1117/12.474295
Event: Applications of Photonic Technology 5, 2002, Quebec City, Canada

Abstract

In silica glass frozen-in temperature of glass structure, so-called the fictive temperature, is strongly related to optical properties such as the Rayleigh scattering intensity and location of ultraviolet absorption edge. We investigated these optical properties with respect to the fictive temperature of samples with various fluorine concentrations. Furthermore, the structural relaxation during glass forming process was systematically examined. We have found that doping of fluorine strongly encourages the structural relaxation and lowers the fictive temperature. We have also found that relations between the fictive temperature and the optical properties vary sensitively to fluorine concentration.

Citation Download Citation

Hiroshi Kakiuchida, Kazuya Saito, Noriyuki Hiramitsu, and Akira J. Ikushima "Effects of halogen doping on structure of silica glass as a photonic material", Proc. SPIE 4833, Applications of Photonic Technology 5, (17 February 2003); https://doi.org/10.1117/12.474295

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