Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft x-ray source

H. Fiedorowicz; A. Bartnik; R. Jarocki; J. Kostecki; R. Rakowski; M. Szczurek

doi:10.1117/12.615890

27 August 2005 Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft x-ray source

H. Fiedorowicz, A. Bartnik, R. Jarocki, J. Kostecki, R. Rakowski, M. Szczurek

Author Affiliations +

Proceedings Volume 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II; 59310H (2005) https://doi.org/10.1117/12.615890
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

The results of experiments on micromachining of organic polymers by direct photo-etching using a compact laser plasma soft X-ray source based on a gas puff target are presented. Soft X-ray radiation in the wavelength range from 2 to 15 nm was produced as a result of irradiation of a double-stream gas puff target with 0.8 J/3 ns laser pulses from a Nd:YAG laser. The soft X-ray pulses with energy of about 100-200 mJ in a single pulse were used to irradiate samples from organic polymers to form microstructures. The obtained results show that direct photo-etching using the laser plasma soft X-ray source could be useful for micromachining of organic polymers. Strong enhancement of the photo-etching process was observed for the samples heated up to 140^oC.

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H. Fiedorowicz, A. Bartnik, R. Jarocki, J. Kostecki, R. Rakowski, and M. Szczurek "Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft x-ray source", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310H (27 August 2005); https://doi.org/10.1117/12.615890

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