Paper
21 June 2002 CMOS-compatible wells for integrated high-speed screening arrays
Bonnie L. Gray, R. Moerman, L. Richard van den Doel, Heidi R. C. Dietrich, Ventzeslav P. Iordanov, Nga Phuong Pham, Pasqualina M. Sarro, Andre Bossche, Michael J. Vellekoop
Author Affiliations +
Abstract
This paper explores the use of photo patternable polymers for integrated high-speed screening arrays, where enzyme reactions are monitored in nano liter volume reactors using fluorescence of NADH and photodiode detection. Implementing the array of nano liter volume wells using a low-temperature CMOS-compatible process allows wells to be patterned after the photodiode array and electronics fabrication is completed. We demonstrate filling of 400 X 400 micron square, 25 micron deep photoresist-on-silicon wells with liquid samples by electro spray and wetting. We also demonstrate usability of the wells on NADH samples by measuring the fluorescence of 0.1, 0.5 and 1 millimolar NADH solutions using external optics.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bonnie L. Gray, R. Moerman, L. Richard van den Doel, Heidi R. C. Dietrich, Ventzeslav P. Iordanov, Nga Phuong Pham, Pasqualina M. Sarro, Andre Bossche, and Michael J. Vellekoop "CMOS-compatible wells for integrated high-speed screening arrays", Proc. SPIE 4626, Biomedical Nanotechnology Architectures and Applications, (21 June 2002); https://doi.org/10.1117/12.472071
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Photoresist materials

Photodiodes

Luminescence

Silicon

Polymers

Liquids

Glasses

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