The F2-laser Nano fabrication Facility at the University of Toronto delivers high-fluence 157-nm radiation at high resolution to micro fabricate high-finesse silica-based optical components. The 7.9-eV photons drive strong material interactions near the band-edge states of fused silica and related glasses that help avoid microcrack formation, a common limitation of longer wavelength laser. The strong interactions provide for small and smooth excisions, offering depth control on a scale of tens of nanometers. A 157-nm beam homogenization system and a 25x Schwarzschild lens provided a uniform on-target fluence of 9 J/cm2 in a 0.25 mm by 0.25 mm field. Larger work are was enabled by synchronously driving the projection mask and target motion stages. The 0.4 NA lens supported the formation of high- aspect channel walls and surface-relief features as small as approximately 500 nm. Both mask projection and direct writing technique were employed. The novel aspects of the optical beam delivery system are presented together with results on fabricating micro-channels, cutting optical fiber, fabricating surface relief grating and cylindrical lens. The results demonstrate broad application directions for fabricating telecommunication devices, general optical and photonic components, and biological devices.© (2002) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.