Influence of ambient gas on the photoluminescence of sol-gel derived TiO<sub>2</sub>:Sm<sup>3+</sup> films

Valter Reedo; Sven Lange; Valter Kiisk; Argo Lukner; Tanel Tätte; Ilmo Sildos

doi:10.1117/12.639162

12 June 2006 Influence of ambient gas on the photoluminescence of sol-gel derived TiO₂:Sm³⁺ films

Valter Reedo, Sven Lange, Valter Kiisk, Argo Lukner, Tanel Tätte, Ilmo Sildos

Proceedings Volume 5946, Optical Materials and Applications; 59460F (2006) https://doi.org/10.1117/12.639162
Event: Optical Materials and Applications, 2005, Tartu, Estonia

Abstract

Photoluminescence (PL) of TiO₂:Sm³⁺ thin films was studied at RT. The films were prepared by the sol-gel spin-coating technique or by atomic layer deposition (ALD) followed by ion implantation. The PL was excited with a Nd:YAG pulse laser emitting at 355 nm. The spectrum of PL consists of intense Sm³⁺-specific emission lines with a well-pronounced fine structure. The influence of different gaseous environments (air, oxygen, nitrogen) or vacuum on the Sm³⁺ emission was investigated. In the case of a permanent irradiation of sol-gel films in an oxygen-containing environment, the PL intensity increased. The increase was significantly large but slow. The subsequent evacuation of the measurement chamber led to a rapid decrease of the emission below the detection limit. When the oxygen-containing gas was without any intermediate evacuation replaced by nitrogen, the PL intensity descended to an almost vacuum level. The subsequent exposure to oxygen led to a rather fast emission recovery. The ALD-prepared films exhibited a similar but markedly slower response. The fast response observed was attributed to the adsorption of oxygen on the surface, and the slower one, to the diffusion of oxygen vacancies taking place under the irradiation in the bulk.

Citation Download Citation

Valter Reedo, Sven Lange, Valter Kiisk, Argo Lukner, Tanel Tätte, and Ilmo Sildos "Influence of ambient gas on the photoluminescence of sol-gel derived TiO₂:Sm³⁺ films", Proc. SPIE 5946, Optical Materials and Applications, 59460F (12 June 2006); https://doi.org/10.1117/12.639162

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